Bücher der Reihe Springer Series in Surface Sciences

This book focuses on surface activity of electron emission (EE). Prior to protective painting, a steel surface is usually grit blasted or sandblasted to remove scale and contaminants and to roughen the surface. This book emphasizes that such surface treatment causes EE, increasing the strength of paint adhesion. Introduced here are the experimental results of thermally assisted photoelectron emission (TAPE) and tribo-stimulated (rubbing) electron emission (TriboEE) from practical metals after different kinds of surface-treatment processes. A detailed description is given of how Arrhenius activation energies relating to electron transfer through the surface overlayer and also the energy levels of electrons trapped in the overlayer can be obtained, and how TAPE and TriboEE data can be influenced by the chemical properties of that overlayer. This book is composed of four parts: I. Surface treatment processes; II. The principle of EE analysis used for practical surfaces; III. Materials and methods of EE and X-ray photoelectron spectroscopy (XPS); IV. EE and XPS characteristics of practical surfaces. In the last part, the EE and XPS results for metals, semiconductors, and carbon materials are drawn from the author's own publications. The book will be useful for researchers engaging in surface-treatment processes of various materials.

Scanning Tunneling Microscopy II, like its predecessor,presents detailed and comprehensive accounts of the basicprinciples and broad range of applications of STM andrelated scanning probe techniques. The applicationsdiscussed in this volume come predominantly from the fieldsof electrochemistry and biology. In contrast to thosedescribed in Vol. I, these sudies may be performed in airand in liquids. The extensions of the basic technique tomap other interactions are described inchapters on scanningforce microscopy, magnetic force microscopy, scanningnear-field optical microscopy, together with a survey ofother related techniques. Also described here is the use ofa scanning proximal probe for surface modification. Togehter, the two volumes give a comprehensive account ofexperimental aspcets of STM. They provide essentialreadingand reference material for all students and researchersinvolvedin this field.

This significantly extended second edition addresses the important physical phenomenon of Surface Plasmon Resonance (SPR) or Surface Plasmon Polaritons (SPP) in thin metal films, a phenomenon which is exploited in the design of a large variety of physico-chemical optical sensors.

This book presents developments of techniques for detection and analysis of two electrons resulting from the interaction of a single incident electron with a solid surface.

As well as coverage of the base concepts in thin film theory, this volume has details of many of the latest results in the field, including materials mixtures and nanostructured coatings. It includes dedicated software packages for materials characterization.

This book presents the important analytical technique of magnetic microscopy. This book presents a number of layer-resolving magnetic imaging techniques that have evolved recently. This in turn requires techniques with the appropriate spatial resolution and magnetic sensitivity.

This comprehensive work on pulsed laser ablation explicitly links the principles and methodology to the physical properties of the irradiated materials. From the basics to the most advanced topics, it incorporates the latest theory and experimental data.

This monograph deals with the kinetics of adsorption and desorption of molecules physisorbed on solid surfaces. To keep this monograph to a reasonable size, and also to allow for some unity in the presentation of the material, we had to omit a number of topics related to physisorption kinetics.

This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples.

In modern scanning electron microscopy, sample surface preparation is of key importance. This book presents the procedures for sample surface preparation, thereby facilitating unprecedented capabilities with advanced scanning electron microscopes.

Using the continuum of interface-induced gap states (IFIGS) as a unifying theme, Moench explains the band-structure lineup at all types of semiconductor interfaces.

This is the first ever comprehensive treatment of NEXAFS spectroscopy. It is suitable for novice researchers as an introduction to the field, while experts will welcome the detailed description of state-of-the-art instrumentation and analysis techniques, along with the latest experimental and theoretical results.

Surfaces and interfaces play an increasingly important role in today's solid state devices. The emphasis of the book is on semiconductor surfaces and interfaces but it also includes a thorough treatment of transition metals, a general discussion of phonon dispersion curves, and examples of large computational calculations.

Scanning tunnelling microscopy (STM) is a powerful technique for surface analysis with atomic resolution. The book appeals to researchers, advanced students and analysts in industrial laboratories.

Crystal growth far from thermodynamic equilibrium is nothing but homoepitaxy - thin film growth on a crystalline substrate of the same material. Because of the absence of misfit effects, homoepitaxy is an ideal playground to study growth kinetics in its pure form.

This third edition has been thoroughly revised and updated. In particular it now includes an extensive discussion of the band lineup at semiconductor interfaces. The unifying concept is the continuum of interface-induced gap states.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors' previous volume "Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces," presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

This monograph discusses the essential principles of the evaporationprocess by looking at it at the molecular and atomic level.In the first part methods of statistical physics, physical kinetics andnumerical modeling are outlined including the Maxwell's distributionfunction, the Boltzmann kinetic equation, the Vlasov approach, and theCUDA technique.The distribution functions of evaporating particles are then defined.Experimental results on the evaporation coefficient and the temperaturejump on the evaporation surface are critically reviewed and compared tothe theory and numerical results presented in previous chapters.The book ends with a chapter devoted to evaporation in differentprocesses, such as boiling and cavitation.This monograph addressesgraduate students and researchers working on phase transitions andrelated fields.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

This book provides a comprehensive introduction to a recently-developed approach to the growth mechanism of thin films and nanostructures via chemical vapour deposition (CVD).

This monograph discusses the essential principles of the evaporationprocess by looking at it at the molecular and atomic level.In the first part methods of statistical physics, physical kinetics andnumerical modeling are outlined including the Maxwell's distributionfunction, the Boltzmann kinetic equation, the Vlasov approach, and theCUDA technique.The distribution functions of evaporating particles are then defined.Experimental results on the evaporation coefficient and the temperaturejump on the evaporation surface are critically reviewed and compared tothe theory and numerical results presented in previous chapters.The book ends with a chapter devoted to evaporation in differentprocesses, such as boiling and cavitation.This monograph addressesgraduate students and researchers working on phase transitions andrelated fields.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors¿ previous volume ¿Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces,¿ presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.