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Three-Dimensional Simulation of Semiconductor Devices

Über Three-Dimensional Simulation of Semiconductor Devices

The three-dimensional device simulation has become a necessary tool for the design and investigation of complex device structures. The evolution of the three-dimensional simulation tools is directly linked to the scaling of the devices and the increasing complex­ ity of dynamic random access memory (DRAM) cells. Scaling of MOSFET devices led to a three-dimensional geometry with effects which cannot be handled by two-dimensional simulations anymore. With increasing integration density in DRAMs the third dimen­ sion had to be utilized to realize the storage capacitor. The result­ ing leakage problems have to be investigated and the cell design optimized by means of three-dimensional simulations. This book is intended for senior undergraduate students in applied physics, electrical engineering and computational physics, as well as for scientists and engineers involved in semiconductor device re­ search and development. It is also intended for software engineers and all those who are concerned with simulation. The book will give an overview on the problems and activities con­ cerning three-dimensional device simulation, without the claim of being a classical textbook. It starts from the classical semiconduc­ tor equations, discusses the physical models used in device simu­ lation, describes the discretization and some numerical methods for solving the differential equations. The application of the three­ dimensional simulation to VLSI device engineering is illustrated by a few specific examples.

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  • Sprache:
  • Deutsch
  • ISBN:
  • 9783034877329
  • Einband:
  • Taschenbuch
  • Seitenzahl:
  • 124
  • Veröffentlicht:
  • 14. Dezember 2012
  • Ausgabe:
  • 11991
  • Abmessungen:
  • 229x152x7 mm.
  • Gewicht:
  • 186 g.
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Beschreibung von Three-Dimensional Simulation of Semiconductor Devices

The three-dimensional device simulation has become a necessary tool for the design and investigation of complex device structures. The evolution of the three-dimensional simulation tools is directly linked to the scaling of the devices and the increasing complex­ ity of dynamic random access memory (DRAM) cells. Scaling of MOSFET devices led to a three-dimensional geometry with effects which cannot be handled by two-dimensional simulations anymore. With increasing integration density in DRAMs the third dimen­ sion had to be utilized to realize the storage capacitor. The result­ ing leakage problems have to be investigated and the cell design optimized by means of three-dimensional simulations. This book is intended for senior undergraduate students in applied physics, electrical engineering and computational physics, as well as for scientists and engineers involved in semiconductor device re­ search and development. It is also intended for software engineers and all those who are concerned with simulation. The book will give an overview on the problems and activities con­ cerning three-dimensional device simulation, without the claim of being a classical textbook. It starts from the classical semiconduc­ tor equations, discusses the physical models used in device simu­ lation, describes the discretization and some numerical methods for solving the differential equations. The application of the three­ dimensional simulation to VLSI device engineering is illustrated by a few specific examples.

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